| abstract |
PURPOSE: To provide the compsn. having high image resolution and high sensitivity to short wavelength UV rays by selecting the kind and position of the substituent of the arom. group of an arom. iodonium salt or arom. sulfonium salt. n CONSTITUTION: This compsn. is the acid generating agent expressed by the formula Ar 2 IX or Ar 3 SX in which Ar contains a p-alkyl substd. arom. group or m,m-dialkyl substd. arom. group and X contains the acid generating agent which is any of trifluoromethane sulfonic acid, trifluoroacetic acid, and p-toluene sulfonic acid. Namely, a p-alkyl substd. phenyl group or m,m-dialkyl substd. phenyl group is selected as Ar in the compd. expressed by the formula Ar 2 IX or Ar 3 SX, by which the UV rays absorption of the product is decreased. The negative type resist compsn. which has the excellent sensitivity to the short wavelength UV rays, electron rays, X-rays and other active rays and has high image resolution is obtd. in this way. n COPYRIGHT: (C)1990,JPO&Japio |