| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3af3390937c06df72b00e23a42cf63ef |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0295
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-023 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-029
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 |
| filingDate |
1990-05-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6a3a12c597538d65a3c585115f16a9fe
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_017a8935381f32845f8068d37ede0fb3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_15476a002f1a24a1b9773203cd5501bf |
| publicationDate |
1991-04-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H0387746-A |
| titleOfInvention |
Photoresist composition |
| abstract |
PURPOSE: To selectively remove an exposed part or nonexposed part of a positive or negative photoresist coating film and to transfer an image to a base by incorporating a mixture of a specified resin binder and a photosensitive component into a photoresist compsn. n CONSTITUTION: This photoresist compsn. contains a mixture of a resin binder and a photosensitive component. The resin binder contains a copolymer having phenol-based structural units in over the half amt. and cyclic alcohol-based structural units in less than the half amt. The density of the copolymer is controlled to such a degree that the amt. of the copolymer is not enough to prevent development of an exposed film of the photoresist in the developer of the photoresist. The photosensitive component is present in such an amt. that produces a latent image by exposure of the photoresist coating film to active radiation. Thereby, an exposed part or nonexposed part of the photoresist coating film can be selectively removed and an image can be transferred to a base. n COPYRIGHT: (C)1991,JPO |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2477073-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6511783-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1693704-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H04367865-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-RE38256-E
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H04110945-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6528233-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H07140666-A |
| priorityDate |
1989-05-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |