http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018194166-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8205ec6ee1cd95eb60a03826535bad97 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0755 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-023 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-10 |
| filingDate | 2018-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8a7a38ad4ab840df08c918723515f76c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a81cc54afbc521a77e7f4f245358c27d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a41e83185186010f231e1da5cf90a873 |
| publicationDate | 2018-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2018194166-A1 |
| titleOfInvention | Photosensitive resin composition |
| abstract | [Problem] To provide a photosensitive resin composition which is used for a liquid crystal display element, an organic EL display element and so on, enables maintenance of a good image after being cured, and is able to form an image of a cured film that allows high liquid repellency of the surface of the cured film, little residue, and a high lyophilic property of a substrate without plasma processing, UV ozone processing and so on. [solution] A thermally curable photosensitive resin composition containing a compound (A), a compound (B), a solvent (C), and a compound D, the compound (A) and/or the compound (B) having an amide radical. Compound (A): a polymer having the following radicals (A1) and (A2) (A1) a liquid-repellent radical (A2) at least one radical selected from the group consisting of a carboxyl radical and an amide radical, Compound (B): alkali-soluble resin having at least one radical selected from the group consisting of a carboxyl radical and an amide radical, Solvent (C), and Compound (D): a sensitizer. |
| priorityDate | 2017-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 910.