| abstract |
[PROBLEMS] To provide: a photosensitive resin composition from which a coating film pattern having high pattern surface water repellency even after a treatment with a plasma or the like and having insulating properties can be easily formed with high accuracy at a high throughput rate; and a cured film which is obtained from such positive photosensitive resin composition and is suitable for use as a film material for various displays. [MEANS FOR SOLVING PROBLEMS] The positive photosensitive resin composition comprises: ingredient (A) which is an alkali-soluble resin obtained by copolymerizing (i) an unsaturated carboxylic acid with (ii) at least one compound selected from the group consisting of acrylic ester compounds, methacrylic ester compounds, maleimide compounds, acrylonitrile, maleic anhydride, styrene compounds, and vinyl compounds; ingredient (B) which is a siloxane compound having a number-average molecular weight of 100-2,000; ingredient (C) which is a 1,2-quinonediazide compound; ingredient (D) which is a crosslinking compound; and a solvent (E). |