| abstract |
[PROBLEMS] To easily form a patterned thin film having high radiation sensitivity, excellent development margin and excellent adhesion to a substrate, and suitable for forming an interlayer insulating film and a microlens. A radiation composition is provided. SOLUTION: At least one selected from the group consisting of an unsaturated carboxylic acid and an unsaturated carboxylic acid anhydride and at least one selected from the group consisting of an oxiranyl group-containing unsaturated compound and an oxetanyl group-containing unsaturated compound are contained. A radiation-sensitive resin composition comprising an unsaturated mixture copolymer, a 1,2-quinonediazide compound, and a silsesquioxane having an aryl group having 6 to 15 carbon atoms. [Selection figure] None |