Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
filingDate |
2006-11-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_79a4c297fe26465f427b7bf18a643a56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1ab9fd0e67049447b5c4db1f50f5e898 |
publicationDate |
2007-05-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
EP-1783550-A1 |
titleOfInvention |
Positive resist composition and pattern formation method using the positive resist composition |
abstract |
A positive resist composition comprises: (A) a resin that contains a repeating unit (A1) having a lactone structure and a cyano group, and increases its solubility to an alkali developer by action of an acid; (B) a compound that generates an acid by irradiation with actinic ray or radiation; and (C) a solvent. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008304773-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7442490-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1835340-A1 |
priorityDate |
2005-11-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |