http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9244349-B2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bad952b21525d0f6ca9fb4546b1ac007 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_935153bba8a91b7b49cb9ea846f05bbb |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2010-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2016-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2b51fab31bff446ccb48a87ab53cc8b8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_059e26e9305441379210e3ef77e4573c |
| publicationDate | 2016-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-9244349-B2 |
| titleOfInvention | Positive resist composition and method of forming resist pattern |
| abstract | A positive resist composition including a base component, an acid-generator component and a fluorine-containing polymer component (F) in a specific amount, the fluorine-containing polymer component (F) including a fluorine-containing polymer (F1) consisting of a structural unit (F-1) represented by general formula (F-1) (R C represents a hydrogen atom or a methyl group, R 1 and R 2 represent a hydrogen atom, an alkyl group or a fluorinated alkyl group, R 3 represents a fluorine atom or a fluorinated alkyl group, and R 4 represents an alkyl group or a fluorinated alkyl group) or a fluorine-containing copolymer (F2) containing the structural unit (F-1) and at least one structural unit selected from the group consisting of a structural unit (F-2) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group and a structural unit (F-3) represented by general formula (F-3) (R C represents a hydrogen atom or a methyl group, Z represents a single bond or a divalent linking group, and r represents an integer of 0 to 2). |
| priorityDate | 2009-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 108.