| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-28 |
| filingDate |
2006-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9934d76f5c383f53db84f9b59d623b78
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0af87f7f14f76735a6cd8f4c4a79a267 |
| publicationDate |
2008-04-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2008096816-A |
| titleOfInvention |
Positive resist composition for immersion exposure and method for forming resist pattern |
| abstract |
Provided are a positive resist composition for immersion exposure and a method for forming a resist pattern, which have good lithography characteristics and have hydrophobicity suitable for immersion exposure. A resin component (A) whose alkali solubility is increased by the action of an acid, an acid generator component (B) which generates an acid upon exposure, a fluorine atom and / or a fluorinated alkyl as a substituent in the formula A positive resist composition for immersion exposure, comprising an acrylic ester resin component (C) comprising a structural unit represented by a C 4-12 aliphatic cyclic group having a group. [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2008087840-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010102329-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8541159-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9244349-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013101370-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010002870-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8846838-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8742038-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8475997-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8975002-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008274070-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8642244-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008001767-A |
| priorityDate |
2006-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |