abstract |
A polymer compound useful as a base component of a positive resist composition, a positive resist composition containing the polymer compound, and a resist pattern forming method using the positive resist composition are provided. A structural unit including a cyclic group having —SO 2 — in the ring skeleton, a structural unit including a fluorine atom, and a structural unit different from each of the structural units and including an acid dissociable, dissolution inhibiting group. A positive resist composition containing a polymer compound having a structural unit derived from an acrylate ester. [Selection figure] None |