| abstract |
Disclosed is a radiation-sensitive composition having a large receding contact angle and less development defects, which provides a good pattern shape, while hardly dissolving into an immersion liquid during a liquid immersion exposure. The radiation-sensitive composition contains a fluorine-containing polymer having a repeating unit (1) derived from a compound represented by general formula (1), and a solvent.n(In general formula (1), R 1 represents a methyl group or the like; R 2 represents a 1-methylethylene group or the like; R 3 's independently represent an alkyl group having 1-4 carbon atoms, or the like; and X represents a fluoroalkylene group having 1-20 carbon atoms.) |