| abstract |
An acrylate derivative represented by the following general formula (1): n n n n n n n n n n (in the formula, R 1 represents a hydrogen atom, a methyl group or a trifluoromethyl group; each of R 2 , R 3 , R 5 , R 7 , R 8 , R 9 and R 10 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group or an alkoxy group; each of R 4 and R 6 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group or an alkoxy group, or R 4 and R 6 are bonded to each other to represent an alkylene group, —O— or —S—; n represents 0, 1 or 2; and W represents an alkylene group or a cycloalkylene group); an intermediate thereof; a method for producing the same; a polymer compound which is obtainable from polymerization of a raw material containing the foregoing acrylate derivative and which is excellent in solubility in an organic solvent used for the preparation of a photoresist composition; and a photoresist composition containing the polymer compound, an organic solvent and a photo acid generator and having excellent adhesion to substrate and less pattern collapse, are provided. |