| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-343
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1806
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1812
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-281 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-282
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1807
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0035
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1811
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1808 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate |
2011-01-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3627f3e1c84df3f9e0ca6d334dbc4eaa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb2cdfdb7a2bcaed73932a50e34f222e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4cb73d2f3d5841f9c78cfa6e04352ca6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_813e0e460b2bf852de31d8762bc4b614 |
| publicationDate |
2011-05-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2011104612-A1 |
| titleOfInvention |
Positive-type radiation-sensitive composition, and resist pattern formation method |
| abstract |
A positive-tone radiation-sensitive composition is used in a resist pattern-forming method as a first positive-tone radiation-sensitive composition. A positive-tone radiation-sensitive composition includes a polymer, a photoacid generator, and a solvent. The polymer includes an acid-labile group and a crosslinkable group. The resist pattern-forming method includes providing the first positive-tone radiation-sensitive composition on a substrate to form a first resist pattern on the substrate. The first resist pattern is made to be inactive to light or heat so that the first resist pattern is insoluble in a second positive-tone radiation-sensitive composition. The second positive-tone radiation-sensitive composition is provided on the substrate to form a second resist pattern on the substrate on which the first resist pattern is formed. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11703760-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018151351-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016284559-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9244349-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I748007-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013216960-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013078571-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9805943-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11112698-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010310985-A1 |
| priorityDate |
2008-07-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |