| abstract |
The present invention relates to a resist composition that can be used for forming a pattern using a high energy beam or an electron beam having a wavelength of 300 nm or less, and that can form a pattern excellent in rectangularity without impairing transparency to exposure. And a fluorine-containing compound useful for introducing the structure into the fluorine-containing polymer compound. A fluorine-containing polymer compound having a weight average molecular weight of 1,000 to 1,000,000 containing a repeating unit represented by the following general formula (2), and a resist composition using the same. (Wherein R 2 represents an acid labile protecting group, R 3 represents a fluorine atom or a fluorine-containing alkyl group, W represents a divalent linking group. R 4 , R 5 and R 6 are each independently hydrogen. Atom, fluorine atom or monovalent organic group, or may be combined with each other to form a ring.) [Selection figure] None |