| abstract |
Provided is a positive resist material that has high sensitivity and high resolution in exposure with a high energy beam, and has low line edge roughness due to suppression of swelling during development and few residues after development. To do. At least one of the repeating unit represented by the following general formula (1a), the repeating unit represented by the following general formula (2a), the repeating unit represented by the following general formula (3b), and the following general formula A high-molecular compound having a repeating unit represented by the formula (1c), and a positive resist material containing this as a base resin. Embedded image [Selection figure] None |