| abstract |
A polymerizable fluoromonomer represented by general formula (1). In the formula, R 1 represents hydrogen, methyl, fluorine, or trifluoromethyl; n is 0 or 1; m is an integer of 1 to (3+n); and R 2 and R 3 each independently represents hydrogen or a protective group. A resist containing a fluorpolymer obtained by polymerizing or copolymerizing the monomer is suitable for use in microfabrication by immersion exposure or by a double patterning process based on immersion exposure. |