| abstract |
A polymerizable photoacid-generating monomer having excellent performance as a raw material for a photoresist is provided. A monomer compound having the following structure: Wherein each R 1 , R 2 and R 3 is independently H, F, C 1-10 alkyl, fluorine substituted C 1-10 alkyl, C 1-10 cycloalkyl, or fluorine substituted C 1-10 cycloalkyl. Wherein at least one of R 1 , R 2 or R 3 is F; n is an integer from 1 to 10 and A contains a halogenated or non-halogenated C 2-30 olefin It is a polymerizable group, and G + is an organic or inorganic cation. This monomer is the reaction product of a sultone precursor and an oxyanion of a hydroxy-containing halogenated or non-halogenated C 2-30 olefin-containing compound. The polymer comprises a monomer of formula (I). [Selection figure] None |