| abstract |
PROBLEM TO BE SOLVED: To be suitable for use of an exposure light source having a wavelength of 250 nm or less, particularly 220 nm or less, to provide good sensitivity and resolution, to have excellent dry etching resistance, and to allow time-lapse until PEB treatment after exposure. An object of the present invention is to provide a positive photosensitive composition having a small performance variation such as a profile. SOLUTION: A repeating structural unit having a group capable of generating an acid by being decomposed by irradiation with an actinic ray or radiation, a repeating structural unit having an alicyclic group, and a repeating structural unit decomposed by an action of an acid in an alkaline developer. A positive photosensitive composition containing a resin having a repeating structural unit having a group that increases solubility. |