| abstract |
Provided is a chemically amplified resist composition for use in mold production, which is capable of forming a pattern having excellent sensitivity and resolving power and excellent line width roughness (LWR) performance in mold production. A chemically amplified resist composition containing a resin that is decomposed by the action of a specific acid to increase the solubility in an alkaline developer, a method for producing a mold using the resin, and a resist film. [Selection figure] None |