| abstract |
A high molecular compound containing a sulfonium salt as a repeating unit useful as a monomer for a base resin of a positive resist material having high resolution and excellent line edge roughness in photolithography using a high energy beam as a light source A positive resist material containing the above is provided. A resin component (A) that is soluble in an alkaline developer by the action of an acid is contained, and the resin component (A) is (a) a (meth) acrylate unit having an acid labile group, (b) A specific (meth) acrylate unit having a substituent containing a sulfonium salt, (c) a (meth) acrylate unit having a substituent containing a lactone structure, and (d) a specific ethylenic compound unit containing an organic group having a hydroxyl group. A positive resist material which is a polymer compound containing a certain repeating unit. [Selection figure] None |