| abstract |
A polymer compound containing a repeating unit shown by the formula (1c) and one or more repeating units selected from a repeating unit shown by the formula (2) and a repeating unit shown by the formula (3), n nwherein M b + represents a sulfonium cation shown by the formula (a) or an iodonium cation shown by the formula (b),n n n n n n n n n n n This polymer compound is suitable as a base resin of a resist composition capable of forming a resist film that allows pattern formation with extremely high resolution, small LER, and excellent rectangularity. |