| abstract |
Kind Code: A1 A photosensitive composition used in a semiconductor manufacturing process such as an IC, a circuit board such as a liquid crystal and a thermal head, and other photofabrication processes, and a pattern forming method using the photosensitive composition. A resist composition with reduced roughness and suppressed outgas, and a pattern forming method using the resist composition are provided. A resist composition for electron beam, X-ray or EUV, comprising a specific triarylsulfonium compound having a benzenesulfonate anion having a specific substituent, and a pattern forming method using the composition . [Selection figure] None |