| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D7-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-04 |
| filingDate |
2018-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2022-07-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2022-07-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-7101932-B2 |
| titleOfInvention |
Silicon-containing film forming composition for EUV lithography, silicon-containing film for EUV lithography and pattern forming method |
| priorityDate |
2017-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |