Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6b51cde40ffdaf0e9645249e00f89a86 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a00dc29d1b0327757d97ebf7f6b9f5f3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2baf849d216e689ecc40ccc931a7a7bc http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f41c31a0f765d550c9c1fd42b15abd43 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0752 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3086 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-308 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-04 |
filingDate |
2009-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2014-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8c1ba9a298667a7e24a5d91be887ec92 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d00c79c272ca4988105ea5357f82e5d0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bbdbf794ccb696090ba7d21610df7b43 |
publicationDate |
2014-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-8835093-B2 |
titleOfInvention |
Resist underlayer film forming composition containing silicon having anion group |
abstract |
There is provided a resist underlayer film forming composition for lithography for forming a resist underlayer film capable of being used as a hardmask. A resist underlayer film forming composition for lithography comprising a silane compound containing an anion group, wherein the silane compound containing an anion group is a hydrolyzable organosilane in which an organic group containing an anion group is bonded to a silicon atom and the anion group forms a salt structure, a hydrolysis product thereof, or a hydrolysis-condensation product thereof. The anion group may be a carboxylic acid anion, a phenolate anion, a sulfonic acid anion, or a phosphonic acid anion. The hydrolyzable organosilane may be a compound of Formula (1): R 1 a R 2 b Si(R 3 ) 4−(a+b) (1). A composition comprising a mixture of a hydrolyzable organosilane of Formula (1), and at least one organic silicon compound selected from the group consisting of a compound of Formula (2): R 4 a Si(R 5 ) 4−a (2) and a compound of Formula (3): [R 6 c Si(R 7 ) 3−c ] 2 Y b (3); a hydrolysis product of the mixture; or a hydrolysis-condensation product of the mixture. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9829795-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018039181-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016071736-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10114288-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10007184-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10503072-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11215927-B2 |
priorityDate |
2008-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |