| abstract |
Disclosed is a composition for forming a resist underlayer film for lithography, which is used for forming a resist underlayer film that can be used as a hardmask. Specifically disclosed is a composition for forming a resist underlayer film for lithography, which contains a hydrolyzable organosilane, a hydrolysis product thereof or a hydrolysis-condensation product thereof as a silane. In the composition, a silane having a cyclic amino group is contained in an amount of less than 1% by mole, preferably in an amount of 0.01-0.95% by mole relative to the total silanes. Also specifically disclosed is a film-forming composition containing a hydrolyzable organosilane having a cyclic amino group, a hydrolysis product thereof or a hydrolysis-condensation product thereof. Further specifically disclosed is a composition for forming a resist underlayer film for lithography, which contains a hydrolyzable organosilane having a cyclic amino group, a hydrolysis product thereof or a hydrolysis-condensation product thereof. The cyclic amino group is a secondary amino group or a tertiary amino group. The hydrolyzable organosilane is represented by Formula (1). R1 aR2 bSi(R3)4-(a+b) (1) [In the formula, R1 represents a cyclic amino group or an organic group containing a cyclic amino group.] |