| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_893465b5a321f5491ad2e2fe60b0240b |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-0002 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-5329
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0276 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-532
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 |
| filingDate |
1991-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0d35529cefb2c2ca86dfce133d11eddc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0b477780f2acdb15d3aade50a7e34731 |
| publicationDate |
1993-02-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H0527444-A |
| titleOfInvention |
Silica-based non-reflective planarizing layer |
| abstract |
(57) Summary: A carbon-rich dyed spin-on-glass composition for use in providing a non-reflective planarizing layer on a substrate such as a semiconductor silicon wafer. The spin-on-glass composition comprises a crosslinked polyorganosiloxane polymer solution containing an organic dye that absorbs light. The polyorganosiloxane polymer contains at least 30 atomic percent carbon and an aminoorganotrialkoxylane. This alkoxy group has 1 to 4 carbon atoms. [Effect] These layers can be used as a hard mask by etching the pattern provided on them. These hardmasks are used as a multilayer register, It can also be used to make lithographic masks. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7163778-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4857119-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008003624-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9023588-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7998318-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008172306-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2009104552-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002072489-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100479138-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8864894-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5365809-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7417104-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9217921-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20100135744-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008170984-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003502449-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8815494-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7541134-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007520737-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11392037-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8835093-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8828879-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014016640-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016167092-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015135513-A |
| priorityDate |
1990-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |