| abstract |
A composition for light absorption film formation which comprises: a film-forming composition comprising an organic solvent and a light-absorbing polymer or light-absorbing substance dissolved therein; and a crosslinking agent having blocked isocyanate groups. Since the isocyanate groups of the crosslinking agent have been blocked, the composition containing the crosslinking agent has excellent storage stability. When the composition is applied to a substrate and then baked, crosslinking proceeds to give an antireflection film, which does not intermix with a resist film to be formed thereon by coating and is free from diffusion of a photo-generated acid thereinto from the resist layer. As a result, a resist image free from footing or scum can be formed. |