http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020203852-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8205ec6ee1cd95eb60a03826535bad97 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-405 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-425 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate | 2020-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb1e0e86c2cf7848714344e42591e60b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0114627d932d3a123ce008f8ca37335d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_202a3763df8ec279584f7219e31c5af0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_67122eda1f3f0267f4b4dbc1c16012df http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b41b0648d0a03d2954be68236c3403da http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d26202d366193a30f2471879d7ce63b9 |
| publicationDate | 2020-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2020203852-A1 |
| titleOfInvention | Composition for resist pattern metalation process |
| abstract | [Problem] To provide: a composition which enables amelioration of roughness or collapse of a resist pattern and improvement of etching resistance by metalating a resist of the resist pattern; and a metalation method for a resist pattern, which uses this composition. [Solution] A composition for a resist pattern metalation process, which contains (A) at least one substance that is selected from the group consisting of (a1) metal oxides, (a2) hydrolyzable silane compounds, (a3) hydrolysis products of the hydrolyzable silane compounds and (a4) hydrolysis-condensation products of the hydrolyzable silane compounds, (B) an acid compound that does not contain a carboxylic acid group (-COOH), and (C) an aqueous solvent; and a resist pattern metalation method which uses the above-described composition and provides a resist pattern wherein the components of the composition have permeated through the resist. |
| priorityDate | 2019-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 659.