| abstract |
A radiation-sensitive resin composition useful as a chemically amplified resist that has excellent depth of focus (DOF) and development defects are significantly reduced while maintaining sufficient basic performance as a resist, and the sensitivity A polysiloxane useful as a component of a radiation resin composition is provided. The polysiloxane is — (Si (R) O 2 ) — [R is a —R 1 NHSO 2 R 2 group, and R 1 and R 2 are linear and branched, which may be substituted. Or a cyclic divalent hydrocarbon group (wherein R 2 has no fluorine atom). ], Preferably-(Si (R 3 COOR 4 ) O 2 )-[R 3 is a cyclic divalent hydrocarbon group, and R 4 is a monovalent acid-dissociable group. It has a structural unit represented by [Selection figure] None |