Predicate |
Object |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0752 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0751 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-50 |
filingDate |
2010-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2014-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2014-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-5534250-B2 |
titleOfInvention |
Silicon-containing resist underlayer film forming composition having sulfonamide group |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2017169487-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017169487-A1 |
priorityDate |
2009-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |