| abstract |
A composition for a resist underlayer film is provided. The composition has excellent storage stability and can form a resist underlayer film which has excellent adhesion to a resist film, can improve reproducibility of a resist pattern and is resistant to an alkaline liquid used in development and to oxygen asking during the removal of a resist. The composition comprises a hydrolyzate and/or a condensate of a silane compound of the following formula (A), n R 1 b R 2 c Si (OR 3 ) 4-a (A) n wherein R 1 is a monovalent organic group having at least one unsaturated bond, R 2 individually represents a hydrogen atom, a halogen atom or a monovalent organic group, R 3 individually represents a monovalent organic group, R 1 is a group other than OR 3 , a is an integer of 1 to 3, b is an integer of 1 to 3, and c is an integer of 0 to 2, provided that a=b+c. |