| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fd1c923ea46d110f6bec3c393b55cb11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d41b1b68844cccb6cdfe88e2f7220030
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_43897d30902995f795b4e4f4b353c75a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8209dcf3361c06e7f004f2ec163fe9d8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_695a3c7355394ae7a957e673925b46c9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_91b12859170caf5659425dafd433b549
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_aafe0172ffd94d3486c518b0709bb2b3 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0752 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2006-12-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_658075015d831f6f7869d9e5167c477e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f0915c179cd8e8b05615365b0e8ea18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7bc5b0a69ca28e3d77425cf82a331049
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e055f79127c1af75635f6672b0448027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fd6bfe5291543e37cde293e0f33b2b84
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5dba2bc15343bd42ca1fdbe29775a44f |
| publicationDate |
2008-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2008038863-A1 |
| titleOfInvention |
Novel organosilane polymer, hardmask composition for resist underlayer film comprising the organosilane polymer, and process of producing semiconductor integrated circuit device using the hardmask composition |
| abstract |
A hardmask composition for processing a resist underlayer film is provided. The hardmask composition comprises: (a) an organosilane polymer prepared by reacting polycondensation products of hydrolysates of compounds represented by Formulae 1, 2 and 3: [RO]3Si-Ar (1) (wherein R is methyl or ethyl and Ar is an aromatic ring-containing functional group), [RO]3Si-H (2) (wherein R is methyl or ethyl), and [RO]3 Si-R' (3) (wherein R is methyl or ethyl and R'is substituted or unsubstituted cyclic or acyclic alkyl) with ethyl vinyl ether of Formula 4: CH2 CHOCH2 CH3 (4) in the presence of an acid catalyst; (b) a solvent; and (c) a crosslinking catalyst. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9217921-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8815494-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2372458-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11392037-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8864894-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9023588-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8828879-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8835093-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2372458-A1 |
| priorityDate |
2006-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |