http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C2201-014
Outgoing Links
| Predicate | Object |
|---|---|
| level | 13^^<http://www.w3.org/2001/XMLSchema#integer> |
| symbol | B81C2201/014 |
| modified | 2013-01-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| title | Controlling etch progression by depositing an etch stop layer, e.g. silicon nitride, silicon oxide, metal |
| type | http://data.epo.org/linked-data/def/cpc/SubGroup |
| broader | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C2201-0135 |
Incoming Links
Total number of triples: 531.