http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004197526-A1

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filingDate 2004-02-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_962c1f94a3c784de8d3c53e495334178
publicationDate 2004-10-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2004197526-A1
titleOfInvention Process for fabricating monolithic membrane substrate structures with well-controlled air gaps
abstract A process for fabricating monolithic membrane structures having air gaps is disclosed, comprising the steps of: providing a wafer; depositing and patterning a protective layer on the wafer; providing a trench in the wafer; depositing and patterning a metal in the trench; depositing and patterning a sacrificial layer on the metal; depositing and patterning a membrane pad on the sacrificial layer; providing a polymeric film on the protective layer and sacrificial layer, wherein part of the polymeric film has a tensile stress; and releasing part of the polymeric film from the protective layer and sacrificial layer, wherein the tensile stress of a portion of the polymeric film releases the portion of the polymeric film from the wafer and generates the air gap.
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priorityDate 2003-04-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 59.