| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bf634bf0570a6b528e3761f520a91a78
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_36c0172f6059c0b200188dba42db7fa6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d6eb035fc1afa970da3f3a3d4b2a2dde |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-0002 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-5222
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-7682 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-522 |
| filingDate |
1999-07-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2001-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_224a8b5afc0e980bbb376e5958f54043
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_70875c87a24df97e3d688e007d61d53e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e144197a54da3a34c5781af8a62fd42c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6823c23c4c6df77f79c1fb70a8d861b7 |
| publicationDate |
2001-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6251798-B1 |
| titleOfInvention |
Formation of air gap structures for inter-metal dielectric application |
| abstract |
A method for the formation of an air gap structure for use in inter-metal applications. A metal pattern of metal lines is formed, a layer of Plasma Polymerized Methylsilane (PPMS) resist is deposited on top of this pattern. The surface of the PPMS resist is subjected to selective exposure. The unexposed PPMS is removed after which the process is completed by closing up the openings within the PPMS. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006196843-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-03050868-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-03050868-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7413971-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7595554-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006264036-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005127514-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7128843-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-10142223-C2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-10142224-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10930516-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004197526-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-10142224-C2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6696315-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-10142223-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-1296990-C
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005196950-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7861398-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7084479-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7405637-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008217731-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6645850-B2 |
| priorityDate |
1999-07-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |