http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7128843-B2

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6bd4720aefb28835b9bfc5ff805f891b
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24479
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-2462
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C2201-014
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00158
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B81B3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B3-00
filingDate 2004-02-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2006-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_962c1f94a3c784de8d3c53e495334178
publicationDate 2006-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-7128843-B2
titleOfInvention Process for fabricating monolithic membrane substrate structures with well-controlled air gaps
abstract A process for fabricating monolithic membrane structures having air gaps is disclosed, comprising the steps of: providing a wafer; depositing and patterning a protective layer on the wafer; providing a trench in the wafer; depositing and patterning a metal in the trench; depositing and patterning a sacrificial layer on the metal; depositing and patterning a membrane pad on the sacrificial layer; providing a polymeric film on the protective layer and sacrificial layer, wherein part of the polymeric film has a tensile stress; and releasing part of the polymeric film from the protective layer and sacrificial layer, wherein the tensile stress of a portion of the polymeric film releases the portion of the polymeric film from the wafer and generates the air gap.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9156685-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018534135-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8987845-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11495607-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018374861-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017075598-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10668436-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014131818-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015191350-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016086960-A1
priorityDate 2003-04-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6287979-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6251798-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5461003-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2002020053-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5738799-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5510645-A
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID289
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID453569306
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID3301
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID962
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419512635
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559368
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419474383
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID4873

Total number of triples: 41.