| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0e433c1625fc509a087c912b440da84b |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C2201-014
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C2201-0138 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01R33-0052
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01R33-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01R33-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00365
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00825 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01R33-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B81C1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01R33-00 |
| filingDate |
2017-08-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_52dd9b19976db8b104b764e87502dbf1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7e43c132fa2b0e5c0a082bdcdc729bd7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9885b2c5bb61644e7abf1f105f12b1eb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a05a008b660be41bd0b14812372caf97
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a53dd16a56d78e51402d63d4cabf7e60
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6303b1422915dfa180f2b1bd7ea5e32c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5d688840c67df0ea0302f38962552c33 |
| publicationDate |
2017-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2017341934-A1 |
| titleOfInvention |
Selective patterning of titanium encapsulation layers |
| abstract |
A method comprises forming an etch stop layer, a first titanium layer, a magnetic core, a second titanium layer, and patterning the first and second titanium layers. The etch stop layer is formed above a substrate. The first titanium layer is formed on the etch stop layer. The magnetic core is formed on the first titanium layer. The second titanium layer has a first portion encapsulating the magnetic core with the first titanium layer, and a second portion interfacing with the first titanium layer beyond the magnetic core. The patterning of the first and second titanium layers includes forming a mask over a magnetic core region and etching the first and second titanium layers exposed by the mask using a titanium etchant and a titanium oxide etchant. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019111765-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019111766-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11467231-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11333723-B2 |
| priorityDate |
2016-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |