abstract |
The present invention relates to an aqueous coating composition for coating a photoresist pattern, comprising a polymer comprising at least one unit with an alkylamino group, where the unit has a structure (1), n nwhere, R 1 to R 5 are independently selected from hydrogen and C 1 to C 6 alkyl, and W is C 1 to C 6 alkyl. The invention also relates to a process for imaging a photoresist layer using the present composition. |