| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d72711e97d894c55af805c9de2053ab
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c85d78c6a4459b5dbbc49c82a4c5c107 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F297-083
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L23-0815
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F297-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D153-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-165
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-76
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L53-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L23-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L23-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L23-142
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F293-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-002 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F293-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D153-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2016-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2017-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b448a20ddd314c14d07d169aa03bc292
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5abf3c68e5b0e031e4e92d789a3fe44c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5431e000d3e5004a4fe83a65a63107a7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5f1b928dc05323e09e06b0b4214e4d8c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_175daa1584d10fe872f8c828fbf6e2e2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3adcb78fd782bc9a4efd2dc3483d0292 |
| publicationDate |
2017-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-9703203-B2 |
| titleOfInvention |
Compositions and methods for pattern treatment |
| abstract |
Pattern treatment compositions comprise a block copolymer and an organic solvent. The block copolymer comprises a first block and a second block. The first block comprises a unit formed from a first monomer comprising an ethylenically unsaturated polymerizable group and a hydrogen acceptor group, wherein the hydrogen acceptor group is a nitrogen-containing group. The second block comprises a unit formed from a second monomer comprising an ethylenically unsaturated polymerizable group and a cyclic aliphatic group. Wherein: (i) the second block comprises a unit formed from a third monomer comprising an ethylenically unsaturated polymerizable group, and the second monomer and the third monomer are different; and/or (ii) the block copolymer comprises a third block comprising a unit formed from a fourth monomer comprising an ethylenically unsaturated polymerizable group, wherein the fourth monomer is different from the first monomer and the second monomer. Also provided are pattern treatment methods using the described compositions. The pattern treatment compositions and methods find particular applicability in the manufacture of semiconductor devices for providing high resolution patterns. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10162265-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017170008-A1 |
| priorityDate |
2015-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |