| abstract |
N-vinyllactam derivatives having in the 3-position an -OR', -SO 3 R', -CO 2 R', -PO 3 R', -SO 2 R' or -PO 2 R' group, where R' is C 1-10 alkyl, cycloalkyl, heterocyclic or C 6-12 aryl, are polymerized into homo- and copolymers for use in microlithography for semiconductor manufacture. The polymers are used as a photoresist material suitable for a deep UV process to obtain images of high sensitivity and high resolution can be obtained. |