| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_250af0d5e8ae652cd9c5081150ea0299
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_250db7d3193233a556bf3f41836f767f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9999aef8db47b4b8e61a64e3bead1d33
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_69401087f8aae960bb83613152ca8a62
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_05350691c89c730194925ad6a2292325 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-426 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-422
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 |
| filingDate |
2009-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c297c11928d215ba497c761cc27b9ee7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2a3dd26cfeb146a39813ea2b5d062256
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_733de80299422c5dfc843ef7e69555ba
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a21755d62b03df2da5583b691d966b1e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_814364c774f06e53a178beb664715cd3 |
| publicationDate |
2011-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2011165523-A1 |
| titleOfInvention |
Substrate treating solution and method employing the same for treating a resist substrate |
| abstract |
The present invention provides a resist substrate treating solution and a method employing the solution for treating a resist substrate. This treating solution enables to remove efficiently resist residues remaining on a surface of the resist substrate after development, and further to miniaturize a resist pattern. The solution is used for treating a resist substrate having a developed photoresist pattern, and comprises a solvent incapable of dissolving the photoresist pattern and a polymer soluble in the solvent. The developed resist substrate is brought into contact with the treating solution, and then washed with a rinse solution such as water to remove efficiently resist residues remaining on the resist substrate surface. The solvent and the polymer are preferably water and a water-soluble polymer, respectively. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8101333-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11022891-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11022890-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018239254-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9239520-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010021700-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016274463-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9017934-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9810990-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014255851-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101861898-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105990104-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018239253-A1 |
| priorityDate |
2008-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |