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filingDate 2007-10-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2010-02-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2010028817-A1
titleOfInvention Solution for treatment of resist substrate after development processing and method for treatment of resist substrate using the same
abstract The present invention provides a resist substrate-treating solution for improving defects on a developed pattern surface, and also provides a resist substrate treatment method employing the treating solution. The resist substrate-treating solution comprises a solvent and a nitrogen-containing or oxygen-containing water-soluble polymer such as a polyamine, a polyol or a polyether. In the treatment method, a developed resist pattern is treated with the resist substrate-treating solution and then washed with pure water.
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