| abstract |
(57) [Problem] To form a resist pattern by exposure, there is a limit of miniaturization by wavelength, and it is necessary to exceed this limit. SOLUTION: A resist pattern containing a material that generates an acid upon exposure is covered with a resist containing a material that crosslinks in the presence of an acid. An acid is generated in the resist pattern by heating or exposure, and a crosslinked layer formed at the interface is formed as a coating layer of the resist pattern, thereby making the resist pattern thicker. As a result, the diameter of the hole in the resist and the separation width can be reduced. |