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publicationNumber US-8198014-B2
titleOfInvention Resist cover film forming material, resist pattern forming method, and electronic device and method for manufacturing the same
abstract To provide a material including: a silicon-containing polymer having at least an alkali-soluble group and is represented by the following general formula (1); and an organic solvent capable of dissolving the silicon-containing polymer.n n(SiO 4/2 ) a (R 1 t SiO (4-t)/2 ) b (O 1/2 R 2 ) c   general formula (1)n nwhere R 1 represents at least one of a monovalent organic group, hydrogen atom and hydroxyl group, R 2 represents at least one of a monovalent organic group and hydrogen atom (where R 1 and R 2 each may appear twice or more, and at least one of R 1 and R 2 contains an alkali-soluble group), “t” represents an integer of 1 to 3, “a,” “b,” and “c” represent the relative proportions of their units (where a≧0, b≧0 and c≧0, and “a,” “b,” and “c” are not 0 at the same time), and (R 1 t SiO (4-t)/2 ) b may appear twice or more.
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