| abstract |
(57) [Summary] [PROBLEMS] To prevent unnecessary cross-linking or bottoming from occurring at the bottom of a resist pattern, and to provide a pattern having a good perpendicularity and a small dependence on mixing baking. Provided are a coating agent for forming a finer resist pattern and a method for forming a fine pattern. SOLUTION: A composition containing (A) (A) a water-soluble crosslinking agent or (B) a water-soluble resin, and (B) a water-soluble nitrogen-containing organic compound is used as a film-forming agent for miniaturizing a resist pattern. , And after forming a resist pattern on the substrate using a chemically amplified resist, providing a coating film of the above-mentioned film-forming agent for pattern miniaturization on this, heat treatment to the interface between the resist pattern and the coating film Forming a water-insoluble reaction layer, Next, a non-reactive portion of the coating film is removed with an aqueous solvent to form a fine pattern. |