| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e5db580deca7130dbe51805c6c608b35 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate |
2002-10-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2008-03-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_02602d7bf4a6b83c0a7c1feabedae8f0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_50f4a97d049df833ff4c1ad182ea4d9a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_99bdff9aa47d25894f4e6e415f25ea71
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b5723461c7558a5980085e8a2d52a7f0 |
| publicationDate |
2008-03-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7338750-B2 |
| titleOfInvention |
Resist pattern thickness reducing material, resist pattern and process for forming thereof, and semiconductor device and process for manufacturing thereof |
| abstract |
A resist pattern thickness reducing material has at least one type selected from a water soluble resin and an alkali-soluble resin. A process for forming a resist pattern includes a step for coating the resist pattern thickness reducing material such that the surface of a first resist pattern formed is covered and forming a mixing layer of the resist pattern thickness reducing material and the material of the resist pattern, on the surface of the resist pattern. A process for manufacturing a semiconductor device includes a step for forming a resist pattern on an underlayer; a step for coating the resist pattern with a resist pattern thickness reducing material such that the surface of the resist pattern is covered and forming a mixing layer of a material of the resist pattern and the resist pattern thickness reducing material; a step for developing the resist pattern thickness reducing material to reduce thickness of the resist pattern so as to form a resist pattern reduced in thickness; a step for patterning the underlayer by etching by using the resist pattern as a mask. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009017628-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10429735-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10254651-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10241407-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009311490-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7862982-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007259287-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9869933-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9209028-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8137893-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9666436-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8642474-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9996008-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8715901-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9448486-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11754927-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9760011-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012302066-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10162266-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9583344-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10007179-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9209035-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9696629-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8530357-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010119717-A1 |
| priorityDate |
2002-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |