| abstract |
(57) [PROBLEMS] To establish a method for easily drawing a fine pattern beyond the exposure limit in a patterning technique using a photolithography technique in a vacuum deep ultraviolet region. In a water-soluble or alkali-soluble composition comprising a resin and a crosslinking agent, a nonionic surfactant is provided. Or a resist pattern swelling material characterized by containing at least one of organic solvents selected from the group of organic solvents consisting of alcohols, chain or cyclic esters, ketones, chains or cyclic ethers . |