| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b27b8c5a299b6ceb83eb81ffdf567636
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1434599d8125f53b4d9da4b7c33bfa8b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e5db580deca7130dbe51805c6c608b35 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32139
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76802
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 |
| filingDate |
2011-07-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2015-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a16f2774dd75cb43401cf2262217d948
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4edf744695cafdfd7a3ec245703bc221 |
| publicationDate |
2015-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8980535-B2 |
| titleOfInvention |
Resist pattern improving material, method for forming resist pattern, and method for producing semiconductor device |
| abstract |
To provide a resist matter improving material containing C4-11 linear alkanediol, and water. |
| priorityDate |
2010-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |