Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_099413ae0cf5a2b6398b5151766cd260 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L51-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-00 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-13 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-243 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L51-0004 |
classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-56 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-24 |
filingDate |
2015-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2017-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_682362bc8996cc1e19f354963135932c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_606c2c4de4bf0df5ff3d937ef8ac321f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4f0896e716a9a700c4a0449ebe77c693 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2a1e2f54499f110c461f4a021ceba593 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cf238b0520783f0d18f3f436f3e18cd5 |
publicationDate |
2017-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-9748483-B2 |
titleOfInvention |
Deposition source and organic layer deposition apparatus including the same |
abstract |
A deposition source and an organic layer deposition apparatus that may be simply applied to the manufacture of large-sized display apparatuses on a mass scale and may prevent or substantially prevent deposition source nozzles from being blocked during deposition of a deposition material, thereby improving manufacturing yield and deposition efficiency. A deposition source includes a first deposition source including a plurality of first deposition source nozzles, and a second deposition source including a plurality of second deposition source nozzles wherein the plurality of first deposition source nozzles and the plurality of second deposition source nozzles are tilted toward each other. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11441220-B2 |
priorityDate |
2011-01-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |