| abstract |
A thin film deposition apparatus including a chamber; a deposition source accommodated in the chamber and configured to discharge a deposition material; a deposition source nozzle unit located at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; and a patterning slit sheet located opposite the deposition source nozzle unit inside the chamber and including a plurality of patterning slits arranged in a second direction perpendicular to the first direction, the patterning slit sheet being spaced apart from the substrate, and the thin film deposition apparatus being configured to perform a deposition while at least one of the substrate or the thin film deposition apparatus moves relative to the other in the first direction. |