| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e09d917dfa12291db6e65de7af031e73
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_099413ae0cf5a2b6398b5151766cd260
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9fefc26db07b24c79625a9c768a8db39 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L51-0008 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-042
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-00 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-52 |
| filingDate |
2012-05-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2015-02-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8361352396f1207eac3013ae9ed48edd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_53a5488fcf72720efbd9427fa4f25f10 |
| publicationDate |
2015-02-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-8951610-B2 |
| titleOfInvention |
Organic layer deposition apparatus |
| abstract |
An organic layer deposition apparatus that may be precisely aligned with a substrate during a deposition process. The apparatus includes: a deposition source; a deposition source nozzle unit; and a patterning slit sheet, which is spaced from and smaller than the substrate, and having a plurality of patterning slits arranged in a second direction perpendicular to the first direction. Deposition is performed while the substrate is moved relative to the deposition apparatus in the first direction. The patterning slit sheet includes first and second alignment marks that are spaced from each other. The substrate includes first and second alignment patterns that are spaced from each other. The deposition apparatus also includes first and second camera assemblies for respectively photographing the first alignment mark/pattern and the second alignment mark/pattern. A moving speed of the substrate is synchronized with shooting speeds of the first and second camera assemblies. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10286416-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11430680-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017001259-A1 |
| priorityDate |
2011-07-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |